The GP-65.5 high vacuum control swing valve provides a highly controllable flow conductivity curve, and its smooth opening and closing action can reduce the number and generation level of particles to extremely low levels, which is also one of its core advantages.
This series is designed for demanding processes, such as corrosive etching and cleaning applications in semiconductor production processes. In these scenarios, when the initial controllable conductance is low, a precise and controllable conductance curve is required.
The GP-65.5 series has a diameter of DN 250 mm (10 ") and can precisely control the minimum conductance to only 2 ls ⁻¹. The equipped 32-bit drive controller has excellent data processing capabilities, enabling extremely delicate conductance adjustment and supporting faster drive response speed. Compared with traditional 16 bit controllers, its sensor and control instruction processing speed is significantly improved. The controller provides multiple standard port interfaces that can be easily accessed through a PC or process control unit.
The pendulum valve plate mechanism adopts a sturdy and durable design, which can resist various process by-products. Its opening and closing actions adopt a separate design, reducing seal wear and avoiding particle generation. At the initial stage of valve opening, the first stage flow is achieved by moving vertically away from the valve seat, and then the flow is increased by horizontal movement to achieve precise flow control.
The preset motion sequence can be optimized and adjusted according to the process requirements. To ensure sealing reliability, this series adopts a patented pressure rod mechanism to evenly press the valve plate onto the valve seat, ensuring that the sealing pressure is evenly distributed throughout the sealing surface and ensuring high vacuum sealing performance. Main features of GP-65.5 high vacuum control swing valve

Feature
• Provide reliable isolation in harsh process environments
• Low impact opening and closing, low particle generation
• High process inertness and extremely low residual gas (RGA)
• Fast running and adjustable
• Equipped with a pressure controller
• Optional sensor power supply, only requiring a single power supply

Advantage
• Excellent pressure control performance
• Fast operation with almost no particle production
• Flexible adjustment according to process requirements